Veeco Instruments Inc. (Nasdaq:VECO) announced today that it has shipped
the 50th TurboDisc® EPIK™700 GaN Metal Organic Chemical Vapor Deposition
(MOCVD) System reactor since its introduction ten months ago.
After its launch in September 2014, the award-winning EPIK 700 MOCVD
system has now been installed, qualified and accepted at multiple LED
manufacturers in several key regions around the world. According to
recent customer feedback, the TurboDisc EPIK 700 MOCVD system has
delivered increased LED wafer production with best-in-class uniformity
and easy process transfer between systems saving both time and money.
“Veeco’s EPIK 700 system was designed to facilitate the acceleration of
general lighting by combining the LED industry’s lowest cost of
ownership with its most technologically advanced reactor,” said John
Peeler, Chairman and Chief Executive Officer, Veeco. “These innovations
have allowed EPIK 700 customers to better satisfy the demand for solid
state lighting in existing and emerging applications, particularly in
the area of general lighting.”
The EPIK 700 is Veeco’s latest system in a distinguished line of
technologically advanced MOCVD reactors. Since the introduction of the
TurboDisc K465i™ GaN MOCVD System in 2010, Veeco has steadily increased
its market share becoming the global leader in MOCVD thin film process
equipment. In 2011, Veeco introduced the industry’s first multi-reactor
MOCVD system, the award-winning TurboDisc MaxBright™ GaN Multi-Reactor
MOCVD System.
“The EPIK 700 system features the advanced TurboDisc reactor design with
more than twice the capacity of Veeco’s K465i reactor, which translates
to higher throughput efficiency to conserve expensive fab floor space,”
said Jim Jenson, Senior Vice President and General Manager, Veeco MOCVD.
“Fifty EPIK 700 reactors are the equivalent to more than 100 Veeco K465i
MOCVD reactors. This increased capacity, improved wafer uniformity and
reduced operating expenses, enable LED customers to achieve a cost per
wafer savings of 20 to 40 percent over previous MOCVD systems.”
In March, the EPIK 700 GaN MOCVD System won the 2015 Compound
Semiconductor Industry Award for Innovation voted on by peers for its
innovative and game-changing contributions to the compound semiconductor
industry. Veeco has won the award three times in four years for its
technology breakthroughs.
About Veeco
Veeco’s process equipment solutions enable the manufacture of LEDs,
flexible OLED displays, power electronics, compound semiconductors, hard
disk drives, semiconductors, MEMS and wireless chips. We are the leader
in MOCVD, MBE, Ion Beam, Wet Etch single wafer processing and other
advanced thin film process technologies. Our high performance systems
drive innovation in energy efficiency, consumer electronics and network
storage and allow our customers to maximize productivity and achieve
lower cost of ownership. For information on our company, products and
worldwide service and support, please visit www.veeco.com.
To the extent that this news release discusses expectations or
otherwise makes statements about the future, such statements are
forward-looking and are subject to a number of risks and uncertainties
that could cause actual results to differ materially from the statements
made. These factors include the risks discussed in the Business
Description and Management's Discussion and Analysis sections of Veeco's
Annual Report on Form 10-K for the year ended December 31, 2014 and in
our subsequent quarterly reports on Form 10-Q, current reports on Form
8-K and press releases. Veeco does not undertake any obligation
to update any forward-looking statements to reflect future events or
circumstances after the date of such statements.
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