MILPITAS, Calif., June 14, 2016 (GLOBE NEWSWIRE) -- Nanometrics Incorporated (NASDAQ:NANO), a leading provider of advanced
process control systems, today announced the selection of the company’s flagship Atlas optical critical dimension (OCD) metrology
platform and NanoDiffract® modeling and analysis software, for development and production of third-generation 3D-NAND
devices by a leading flash memory manufacturer. The systems will be used across all aspects of 3D-NAND device manufacturing,
including control of critical thin film deposition and etch processes for the formation of high-aspect-ratio structures in this
customer’s most advanced devices.
“Our customers are continuing to invest in advanced research and development of next-generation 3D-NAND devices to drive
increases in memory density, which has already surpassed hard disk drives, as well as to improve yield, which in turn translates to
lower cost-per-bit and increased manufacturing capacity,” commented Dr. Srini Vedula, vice president of OCD/Thin Film Solutions at
Nanometrics. “Together, the Atlas and NanoDiffract are playing a key role in accelerating manufacturing ramps and improving process
performance, which meaningfully contributes to the competitiveness and financial performance of our customers. This latest
selection highlights the extendibility and robustness of our technology platforms as well as our continued success in customer
collaborations in the rapidly expanding 3D-NAND market.”
Systems will be deployed through the remainder of this year as new factory phases are built out to support additional capacity
for these third-generation 3D-NAND devices.
3D-NAND architectures continue to challenge process modules with ever more device layers and higher aspect ratios of key
semiconductor features. Non-destructive in-line optical control has proven to be an essential part in the successful development
and manufacturing of these devices. Nanometrics’ Atlas systems and NanoDiffract software suite, in combination with Nanometrics’
IMPULSE® and Trajectory® T3 integrated metrology systems, are proven enablers in comprehensive fab-wide
process control. Since its initial launch in 2004, multiple generations of the Atlas system have been deployed across every fab
segment for advanced logic, DRAM, 3D-NAND, advanced non-volatile memory, CMOS image sensor and power device manufacturing.
About Nanometrics
Nanometrics is a leading provider of advanced, high-performance process control metrology and inspection systems used primarily in
the fabrication of semiconductors and other solid-state devices, including sensors, optoelectronic devices, high-brightness LEDs,
discretes and data storage components. Nanometrics’ automated and integrated metrology systems measure critical dimensions, device
structures, topography and various thin film properties, including three-dimensional features and film thickness, as well as
optical, electrical and material properties. The company’s process control solutions are deployed throughout the fabrication
process, from front-end-of-line substrate manufacturing, to high-volume production of semiconductors and other devices, to advanced
three-dimensional wafer-level packaging applications. Nanometrics’ systems enable advanced process control for device
manufacturers, providing improved device yield at reduced manufacturing cycle time, supporting the accelerated product life cycles
in the semiconductor and other advanced device markets. The company maintains its headquarters in Milpitas, California, with sales
and service offices worldwide. Nanometrics is traded on NASDAQ Global Select Market under the symbol NANO. Nanometrics’ website is
http://www.nanometrics.com.
Forward Looking Statements
Certain statements in this press release are forward-looking statements that involve a number of risks and uncertainties that could
cause actual results to differ materially from those described in this release. Although Nanometrics believes that the expectations
reflected in the forward-looking statements are reasonable, actual results could differ materially from these expectations due to a
variety of factors, including, but not limited to, shifts in the timing of product deliveries, the failure to achieve improved
processes, the rate of adoption of our products, customer spending plans, and general economic conditions. For additional
information and considerations regarding the risks faced by Nanometrics that could cause actual results to differ materially, see
its annual report on Form 10-K for the year ended December 26, 2015, as filed with the Securities and Exchange Commission on
February 24, 2016, including under the caption “Risk Factors,” as well as other periodic reports filed with the SEC from time to
time. Nanometrics disclaims any obligation to update information contained in any forward-looking statement, except as required by
law.
Investor Relations Contact: Claire McAdams Headgate Partners LLC 530.265.9899 claire@headgatepartners.com Company Contact: Kevin Heidrich Nanometrics 408.545.6000 kheidrich@nanometrics.com
